Dry etching for VLSI /

Bibliographic Details
Main Author:	Roosmalen, A. J. van
Corporate Author:	SpringerLink (Online service)
Other Authors:	Baggerman, J. A. G., Brader, S. J. H.
Format:	eBook
Language:	English
Published:	New York : Plenum Press, [1991]
Series:	Updates in applied physics and electrical technology.
Subjects:	Semiconductors > Etching. Integrated circuits > Very large scale integration > Design and construction. Plasma etching. Trockenätzen. VLSI. Electronic books.
Online Access:	Connect to the full text of this electronic book

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