Principles of Chemical Vapor Deposition /

Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equip...

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Bibliographic Details

Main Author:	Dobkin, Daniel M.
Corporate Author:	SpringerLink (Online service)
Other Authors:	Zuraw, Michael K.
Format:	eBook
Language:	English
Published:	Dordrecht : Springer Netherlands, 2003.
Subjects:	Chemical engineering. Nuclear physics. Machinery. Surfaces (Physics) Electronic books.
Online Access:	Connect to the full text of this electronic book