NANOLITHOGRAPHY: A Borderland between STM, EB, IB, and X-Ray Lithographies /

Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new fu...

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Bibliographic Details
Main Author: Gentili, M.
Corporate Author: SpringerLink (Online service)
Other Authors: Giovannella, C., Selci, S.
Format: eBook
Language:English
Published: Dordrecht : Springer Netherlands, 1994.
Series:NATO ASI series. Applied sciences ; 264.
Subjects:
Online Access:Connect to the full text of this electronic book
Description
Summary:Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).
Item Description:Electronic resource.
Physical Description:1 online resource (xii, 215 pages)
ISBN:9789401582612 (electronic bk.)
9401582610 (electronic bk.)
ISSN:0168-132X ;