Chemical vapor deposition : thermal and plasma deposition of electronic materials /

This timely reference provides an integrated, ultidisciplinary approach to CVD on a relatively fundamental level, enabling researchers with a basic background in any engineering field to readily understand and apply CVD techniques. At the same time, it becomes the first work to address CVD from the...

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Bibliographic Details

Main Author:	Sivaram, Srinivasan (Author)
Corporate Author:	SpringerLink (Online service)
Format:	eBook
Language:	English
Published:	New York : Springer Science+Business Media, LLC, 1995.
Subjects:	Microelectronics industry. Chemical vapor deposition. Microelectronics > Materials. Electronic books.
Online Access:	Connect to the full text of this electronic book