Pore characterization in low-k dielectric films using x-ray reflectivity : x-ray porosimetry /

Bibliographic Details

Corporate Author:	National Institute of Standards and Technology (U.S.)
Other Authors:	Soles, Christopher L.
Format:	Government Document eBook
Language:	English
Published:	[Gaithersburg, Md.] : U.S. Dept. of Commerce, Technology Administration, National Institute of Standards and Technology, [2004]
Series:	NIST special publication ; 960-13. NIST recommended practice guide.
Subjects:	Dielectric films. Porosity.
Online Access:	https://purl.fdlp.gov/GPO/gpo2707