Computational lithography /

Bibliographic Details
Main Author:	Ma, Xu, 1983-
Other Authors:	Arce, Gonzalo R.
Format:	Book
Language:	English
Published:	Hoboken, N.J. : Wiley, [2010]
Series:	Wiley series in pure and applied optics.
Subjects:	Microlithography > Mathematics. Integrated circuits > Design and construction > Mathematics. Photolithography > Mathematics. Semiconductors > Etching > Mathematics. Resolution (Optics)

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