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Principles of lithography /

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The publication of Principles of Lithography, Third Edition just five years after the previous edition is evidence of the quickly changing and exciting nature of lithography as applied to the production of integrated circuits and other micro- and nanoscale devices. This text is intended to serve as...

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Bibliographic Details
Main Author: Levinson, Harry J.
Corporate Author: Society of Photo-optical Instrumentation Engineers
Format: Book
Language:English
Published: Bellingham, Wash. : SPIE Press, [2010]
Edition:3rd ed.
Subjects:
Integrated circuits > Design and construction.
Microlithography.
Table of Contents:
  • Preface to the third edition
  • Preface to the second edition
  • Preface
  • Overview of lithography
  • Optical pattern formation
  • Photoresists
  • Modeling and thin-film effects
  • Wafer steppers
  • Overlay
  • Masks and reticles
  • Confronting the diffraction limit
  • Metrology
  • Immersion lithography and the limits of optical lithography
  • Lithography costs
  • Extreme ultraviolet lithography
  • Alternative lithography techniques
  • Appendix A: Coherence.