Materials, processes, and reliability for advanced interconnects for micro- and nanoelectronics : symposium held April 14-17, 2009, San Francisco, California, U.S.A. /

Bibliographic Details
Corporate Authors:	Symposium D, "Materials, Processes, and Reliability for Advanced Interconnects for Micro- and Nanoelectronics", Materials Research Society. Spring Meeting
Other Authors:	Gall, Martin, Lin, Qinghuang, 1963-
Format:	Conference Proceeding Book
Language:	English
Published:	Warrendale, Penn. : Materials Research Society, [2009]
Series:	Materials Research Society symposia proceedings ; v. 1156.
Subjects:	Interconnects (Integrated circuit technology) > Congresses. Integrated circuits > Very large scale integration > Congresses. Microelectronics > Congresses. Nanoelectronics > Congresses. Materials > Congresses.

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