Pendeo-epitaxy process optimization of GaN for novel devices applications /

Bibliographic Details
Main Author: Derenge, Michael A.
Corporate Author: U.S. Army Research Laboratory
Format: Government Document Book
Language:English
Published: Adelphi, Md. : Army Research Laboratory, [2008]
Series:ARL-TR (Aberdeen Proving Ground, Md.) ; 4426.
Subjects:
Online Access:https://purl.fdlp.gov/GPO/LPS113050

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