Pendeo-epitaxy process optimization of GaN for novel devices applications /

Bibliographic Details

Main Author:	Derenge, Michael A.
Corporate Author:	U.S. Army Research Laboratory
Format:	Government Document Book
Language:	English
Published:	Adelphi, Md. : Army Research Laboratory, [2008]
Series:	ARL-TR (Aberdeen Proving Ground, Md.) ; 4426.
Subjects:	Epitaxy.
Online Access:	https://purl.fdlp.gov/GPO/LPS113050