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Precursor chemistry of advanced materials : CVD, ALD and nanoparticles /

Bibliographic Details
Corporate Author: SpringerLink (Online service)
Other Authors: Fischer, Roland A.
Format: eBook
Language:English
Published: Berlin ; [London] : Springer, 2005.
Series:Topics in organometallic chemistry ; 9.
Subjects:
Chemical vapor deposition.
Organometallic chemistry.
Electronic books.
Online Access:Connect to the full text of this electronic book
Publisher description
Table of Contents:
  • Gas-phase thermochemistry and mechanism of organometallic tin oxide CVD precursors / M.D. Allendorf ... [et al.]
  • Materials chemistry of group 13 nitrides / A. Devi ... [et al.]
  • Single-source-precursor CVD: Alkoxy and siloxy aluminum hydrides / M. Veith
  • CVD deposition of binary AlSb and GaSb material films
  • a single-source approach / S. Schulz
  • Organometallic precursors for atomic layer deposition / M. Putkonen ... [et al.]
  • Surface reactivity of transition metal CVD precursors: Towards the control of the nucleation step / P. Serp ... [et al.]
  • Organometallic and metallo-organic precursors for nanoparticles / M.A. Malik ... [et al.].