Cover Image

Advanced processes for 193-nm immersion lithography /

Show other versions (1)
Bibliographic Details
Main Author: Wei, Yayi
Other Authors: Brainard, Robert L.
Format: Book
Language:English
Published: Bellingham, Wash. : SPIE Press, [2009]
Series:SPIE monograph ; PM189.
Subjects:
Immersion lithography.
Semiconductors > Etching.
Integrated circuits > Design and construction.
Search Result 1
Cover Image
by Wei, Yayi
Published 2009
Connect to the full text of this electronic book
eBook
Show all versions (2)