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Advanced processes for 193-nm immersion lithography /

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Bibliographic Details
Main Author: Wei, Yayi
Other Authors: Brainard, Robert L.
Format: Book
Language:English
Published: Bellingham, Wash. : SPIE Press, [2009]
Series:SPIE monograph ; PM189.
Subjects:
Immersion lithography.
Semiconductors > Etching.
Integrated circuits > Design and construction.

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Call Number: TK7872.M3 W45 2009
 
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TK7872.M3 W45 2009 Available