Design for manufacturability through design-process integration II : 28-29 February 2008, San Jose, California, USA /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, International SEMATECH
Other Authors:	Singh, Vivek K., Rieger, Michael L.
Format:	Book
Language:	English
Published:	Bellingham, Washington : SPIE, [2008]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 6925.
Subjects:	Integrated circuits > Design and construction > Congresses. Integrated circuits > Defects > Analysis > Congresses. Semiconductors > Design and construction > Congresses. Semiconductor wafers > Defects > Analysis > Congresses. Microelectronics industry > Quality control > Congresses. Quality control > Congresses.
Online Access:	https://www.spiedigitallibrary.org/conference-proceedings-of-SPIE/6925.toc

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