Cover Image

Optical microlithography XXI : 26-29 February 2008, San Jose, California, USA /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, International SEMATECH
Other Authors: Levinson, Harry J., Dusa, Mircea V.
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2008]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 6924.
Subjects:
Integrated circuits > Masks > Congresses.
Microlithography > Congresses.
X-ray lithography > Congresses.
Manufacturing processes > Congresses.
Online Access:https://www.spiedigitallibrary.org/conference-proceedings-of-SPIE/6924.toc
Description
Physical Description:3 volumes (various pagings) : illustrations (some color) ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:9780819471093
0819471097