Cover Image

Optical microlithography XXI : 26-29 February 2008, San Jose, California, USA /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, International SEMATECH
Other Authors: Levinson, Harry J., Dusa, Mircea V.
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2008]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 6924.
Subjects:
Integrated circuits > Masks > Congresses.
Microlithography > Congresses.
X-ray lithography > Congresses.
Manufacturing processes > Congresses.
Online Access:https://www.spiedigitallibrary.org/conference-proceedings-of-SPIE/6924.toc

Internet

https://www.spiedigitallibrary.org/conference-proceedings-of-SPIE/6924.toc

Remote Storage

Holdings details from Remote Storage
Call Number: TK940 .O696 2008
Library Owns: TK940 .O696 2008 (pt.1-3)
Call Number Status Get It
TK940 .O696 2008 pt.1 Available
TK940 .O696 2008 pt.2 Available
TK940 .O696 2008 pt.3 Available