Society of Photo-optical Instrumentation Engineers, International SEMATECH, Levinson, H. J., & Dusa, M. V. (2008). Optical microlithography XXI: 26-29 February 2008, San Jose, California, USA. SPIE.
Chicago Style (17th ed.) CitationSociety of Photo-optical Instrumentation Engineers, International SEMATECH, Harry J. Levinson, and Mircea V. Dusa. Optical Microlithography XXI: 26-29 February 2008, San Jose, California, USA. Bellingham, Washington: SPIE, 2008.
MLA (9th ed.) CitationSociety of Photo-optical Instrumentation Engineers, et al. Optical Microlithography XXI: 26-29 February 2008, San Jose, California, USA. SPIE, 2008.
Warning: These citations may not always be 100% accurate.