Cover Image

Optical microlithography XX : 27 February-2 March 2007, San Jose, California, USA /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, SEMATECH, Inc
Other Authors: Flagello, Donis G.
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2007]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 6520.
Subjects:
Integrated circuits > Masks > Congresses.
Microlithography > Congresses.
X-ray lithography > Congresses.
Manufacturing processes > Congresses.
Description
Physical Description:3 volumes (various pagings) : illustrations (some color) ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:9780819466396
0819466395