Optical microlithography XX : 27 February-2 March 2007, San Jose, California, USA /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, SEMATECH, Inc
Other Authors:	Flagello, Donis G.
Format:	Book
Language:	English
Published:	Bellingham, Washington : SPIE, [2007]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 6520.
Subjects:	Integrated circuits > Masks > Congresses. Microlithography > Congresses. X-ray lithography > Congresses. Manufacturing processes > Congresses.

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