Advances in resist materials and processing technology XXIV : 26-28 February 2007, San Jose, California, USA /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, SEMATECH, Inc
Other Authors: Lin, Qinghuang, 1963-
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2007]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 6519.
Subjects:
Description
Item Description:Previous conference proceedings entitled: Advances in resist technology and processing.
Physical Description:2 volumes (various pagings) : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:9780819466389
0819466387