Advances in resist materials and processing technology XXIV : 26-28 February 2007, San Jose, California, USA /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, SEMATECH, Inc
Other Authors:	Lin, Qinghuang, 1963-
Format:	Book
Language:	English
Published:	Bellingham, Washington : SPIE, [2007]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 6519.
Subjects:	Photoresists > Congresses. Microlithography > Congresses.

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