Cover Image

Emerging lithographic technologies XI : 27 February-1 March 2007, San Jose, California, USA /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, SEMATECH, Inc
Other Authors: Lercel, Michael J. (Michael James), 1969-
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2007]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 6517.
Subjects:
Lithography, Electron beam > Congresses.
Microlithography > Industrial applications > Congresses.
X-ray lithography > Congresses.
X-rays > Industrial applications > Congresses.
Masks (Electronics) > Congresses.
Description
Physical Description:2 volumes (various pagings) : illustrations (some color) ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:9780819466365
0819466360