Emerging lithographic technologies XI : 27 February-1 March 2007, San Jose, California, USA /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, SEMATECH, Inc
Other Authors:	Lercel, Michael J. (Michael James), 1969-
Format:	Book
Language:	English
Published:	Bellingham, Washington : SPIE, [2007]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 6517.
Subjects:	Lithography, Electron beam > Congresses. Microlithography > Industrial applications > Congresses. X-ray lithography > Congresses. X-rays > Industrial applications > Congresses. Masks (Electronics) > Congresses.

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