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Photomask technology 2006 : 19-22 September 2006, Monterey, California, USA /

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Bibliographic Details
Corporate Authors: Symposium on Photomask Technology (26th : Monterey, Calif.), BACUS (Technical group), Society of Photo-optical Instrumentation Engineers
Other Authors: Martin, Patrick M., Naber, Robert J.
Format: Conference Proceeding Book
Language:English
Published: Bellingham, Washington : SPIE, [2006]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 6349.
Subjects:
Integrated circuits > Masks > Congresses.
Microlithography > Congresses.

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Holdings details from Remote Storage
Call Number: TK7874 .S9435 2006
Library Owns: TK7874 .S9435 2006 (pt.1-pt.2)
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TK7874 .S9435 2006 pt.1 Available
TK7874 .S9435 2006 pt.2 Available