Cover Image

Photomask and next-generation lithography mask technology XIII : 18-20 April 2006, Yokohama, Japan /

Bibliographic Details
Corporate Authors: Photomask Japan, BACUS (Technical group), Ōyō Butsuri Gakkai, Society of Photo-optical Instrumentation Engineers
Other Authors: Hōga, Morihisa
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2006]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 6283.
Subjects:
Masks (Electronics) > Congresses.
Integrated circuits > Masks > Congresses.
X-ray lithography > Congresses.
Microlithography > Congresses.
Optoelectronic devices > Design and construction > Congresses.
Description
Item Description:Some earlier proceedings have title: Photomask and X-ray mask technology.
Physical Description:2 volumes (various pagings) : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819463582