Photomask and next-generation lithography mask technology XIII : 18-20 April 2006, Yokohama, Japan /

Bibliographic Details
Corporate Authors:	Photomask Japan, BACUS (Technical group), Ōyō Butsuri Gakkai, Society of Photo-optical Instrumentation Engineers
Other Authors:	Hōga, Morihisa
Format:	Book
Language:	English
Published:	Bellingham, Washington : SPIE, [2006]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 6283.
Subjects:	Masks (Electronics) > Congresses. Integrated circuits > Masks > Congresses. X-ray lithography > Congresses. Microlithography > Congresses. Optoelectronic devices > Design and construction > Congresses.

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