Cover Image

Metrology, inspection, and process control for microlithography XX : 20-23 February 2006, San Jose, California, USA /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, SEMATECH, Inc
Other Authors: Archie, Chas N.
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2006]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 6152.
Subjects:
Integrated circuits > Inspection > Congresses.
Integrated circuits > Measurement > Congresses.
Microlithography > Congresses.
Process control > Congresses.
Description
Physical Description:2 volumes (various pagings) : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819461954