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Metrology, inspection, and process control for microlithography XX : 20-23 February 2006, San Jose, California, USA /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, SEMATECH, Inc
Other Authors: Archie, Chas N.
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2006]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 6152.
Subjects:
Integrated circuits > Inspection > Congresses.
Integrated circuits > Measurement > Congresses.
Microlithography > Congresses.
Process control > Congresses.

Remote Storage

Holdings details from Remote Storage
Call Number: TK7874 .M438 2006
Library Owns: TK7874 .M438 2006 (pt.1-pt.2)
Call Number Status Get It
TK7874 .M438 2006 pt.1 Available
TK7874 .M438 2006 pt.2 Available