APA (7th ed.) Citation

Society of Photo-optical Instrumentation Engineers, SEMATECH, Inc, & Archie, C. N. (2006). Metrology, inspection, and process control for microlithography XX: 20-23 February 2006, San Jose, California, USA. SPIE.

Chicago Style (17th ed.) Citation

Society of Photo-optical Instrumentation Engineers, Inc SEMATECH, and Chas N. Archie. Metrology, Inspection, and Process Control for Microlithography XX: 20-23 February 2006, San Jose, California, USA. Bellingham, Washington: SPIE, 2006.

MLA (9th ed.) Citation

Society of Photo-optical Instrumentation Engineers, et al. Metrology, Inspection, and Process Control for Microlithography XX: 20-23 February 2006, San Jose, California, USA. SPIE, 2006.