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Materials, technology and reliability for advanced interconnects--2005 : symposium held March 28-April 1, 2005, San Francisco, California, U.S.A /

Bibliographic Details
Corporate Authors: Materials Research Society. Fall Meeting, Symposim on Materials, Technology and Reliability for Advanced Interconnects
Other Authors: Besser, Paul R.
Format: Conference Proceeding Book
Language:English
Published: Warrendale, Pa. : Materials Research Society, [2005]
Series:Materials Research Society symposia proceedings ; v. 863.
Subjects:
Semiconductors > Materials > Congresses.
Semiconductors > Junctions > Congresses.
Dielectric films > Congresses.
Integrated circuits > Materials > Congresses.
Integrated circuits > Reliability > Congresses.
Description
Item Description:Previous symposium entitled : Materials, technology and reliability for advanced interconnects and low-k dielectrics.
"Symposium B, 'Materials, Technology and Reliability of Advanced Interconnects,' [was] held March 28-April 1 at the 2005 MRS Spring Meeting in San Francisco, California ..."--Pref.
Physical Description:xiii, 411 pages : illustrations ; 24 cm.
Bibliography:Includes bibliographical references and indexes.
ISBN:1558998160