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EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February 2005, Dresden, Germany /

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Bibliographic Details
Corporate Authors: European Conference on Mask Technology for Integrated Circuits and Microcomponents Dresden, Germany, VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik, Institut für Mikrostrukturtechnik, Semiconductor Equipment and Materials International, Europe, Society of Photo-optical Instrumentation Engineers
Other Authors: Behringer, Uwe F. W.
Format: Conference Proceeding Book
Language:English
Published: Bellingham, Washington : Berlin, Germany : SPIE ; VDE Verlag GmbH, [2005]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 5835.
Subjects:
Integrated circuits > Masks > Congresses.
Microlithography > Congresses.
Description
Physical Description:xxx, 302 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819458309