EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February 2005, Dresden, Germany /

Bibliographic Details
Corporate Authors:	European Conference on Mask Technology for Integrated Circuits and Microcomponents Dresden, Germany, VDE/VDI-Gesellschaft für Mikroelektronik, Mikro- und Feinwerktechnik, Institut für Mikrostrukturtechnik, Semiconductor Equipment and Materials International, Europe, Society of Photo-optical Instrumentation Engineers
Other Authors:	Behringer, Uwe F. W.
Format:	Conference Proceeding Book
Language:	English
Published:	Bellingham, Washington : Berlin, Germany : SPIE ; VDE Verlag GmbH, [2005]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 5835.
Subjects:	Integrated circuits > Masks > Congresses. Microlithography > Congresses.

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