Photomask fabrication technology /

Bibliographic Details
Main Author:	Eynon, Benjamin G.
Other Authors:	Wu, Banqiu
Format:	Book
Language:	English
Published:	New York : McGraw-Hill, [2005]
Series:	McGraw-Hill professional engineering. Electronic engineering.
Subjects:	Integrated circuits > Masks. Masks (Electronics) Microlithography.

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