Cover Image

Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, International SEMATECH
Other Authors: Liebmann, Lars W.
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2005]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 5756.
Subjects:
Integrated circuits > Design and construction > Congresses.
Integrated circuits > Defects > Analysis > Congresses.
Semiconductors > Design and construction > Congresses.
Semiconductor wafers > Defects > Analysis > Congresses.
Microelectronics industry > Quality control > Congresses.
Quality control > Congresses.
Description
Physical Description:xxxv, 438 pages : illustrations (some color) ; 28 cm.
Bibliography:Includes bibliographical references and author index.
ISBN:0819457361