Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, International SEMATECH
Other Authors:	Liebmann, Lars W.
Format:	Book
Language:	English
Published:	Bellingham, Washington : SPIE, [2005]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 5756.
Subjects:	Integrated circuits > Design and construction > Congresses. Integrated circuits > Defects > Analysis > Congresses. Semiconductors > Design and construction > Congresses. Semiconductor wafers > Defects > Analysis > Congresses. Microelectronics industry > Quality control > Congresses. Quality control > Congresses.

Remote Storage