Advances in resist technology and processing XXII : 28 February-2 March 2005, San Jose, California, USA /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, AZ Electronic Materials (USA), Rohm and Haas Company, International SEMATECH
Other Authors:	Sturtevant, John L.
Format:	Book
Language:	English
Published:	Bellingham, Washington : SPIE, [2005]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 5753.
Subjects:	Photoresists > Congresses. Microlithography > Congresses.

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