Cover Image

Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, International SEMATECH
Other Authors: Mackay, R. Scott
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2005]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 5751.
Subjects:
Lithography, Electron beam > Congresses.
Microlithography > Industrial applications > Congresses.
X-ray lithography > Congresses.
X-rays > Industrial applications > Congresses.
Masks (Electronics) > Congresses.
Description
Physical Description:2 volumes (xviii, 1244 pages) : illustrations (some color) ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819457310