Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, International SEMATECH
Other Authors:	Mackay, R. Scott
Format:	Book
Language:	English
Published:	Bellingham, Washington : SPIE, [2005]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 5751.
Subjects:	Lithography, Electron beam > Congresses. Microlithography > Industrial applications > Congresses. X-ray lithography > Congresses. X-rays > Industrial applications > Congresses. Masks (Electronics) > Congresses.

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