Society of Photo-optical Instrumentation Engineers, International SEMATECH, & Mackay, R. S. (2005). Emerging lithographic technologies IX: 1-3 March 2005, San Jose, California, USA. SPIE.
Chicago Style (17th ed.) CitationSociety of Photo-optical Instrumentation Engineers, International SEMATECH, and R. Scott Mackay. Emerging Lithographic Technologies IX: 1-3 March 2005, San Jose, California, USA. Bellingham, Washington: SPIE, 2005.
MLA (9th ed.) CitationSociety of Photo-optical Instrumentation Engineers, et al. Emerging Lithographic Technologies IX: 1-3 March 2005, San Jose, California, USA. SPIE, 2005.
Warning: These citations may not always be 100% accurate.