Cover Image

Advanced microlithography technologies : 8-10 November 2004, Beijing, China /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Zhongguo guang xue xue hui, Australian Optical Society, Guo jia zi ran ke xue ji jin wei yuan hui (China)
Other Authors: Wang, Y.-Y. (Yangyuan), Yao, Jun'en, Progler, Christopher J.
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2005]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 5645.
Subjects:
Microlithography > Congresses.
Integrated circuits > Masks > Congresses.
X-ray lithography > Congresses.
Manufacturing processes > Congresses.
Description
Physical Description:xi, 380 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819456004