Advanced microlithography technologies : 8-10 November 2004, Beijing, China /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, Zhongguo guang xue xue hui, Australian Optical Society, Guo jia zi ran ke xue ji jin wei yuan hui (China)
Other Authors:	Wang, Y.-Y. (Yangyuan), Yao, Jun'en, Progler, Christopher J.
Format:	Book
Language:	English
Published:	Bellingham, Washington : SPIE, [2005]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 5645.
Subjects:	Microlithography > Congresses. Integrated circuits > Masks > Congresses. X-ray lithography > Congresses. Manufacturing processes > Congresses.

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