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24th Annual BACUS Symposium on Photomask Technology : 14-17 October 2004, Monterey, California, USA /

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Bibliographic Details
Corporate Authors: Symposium on Photomask Technology Monterey, Calif., BACUS (Technical group), Society of Photo-optical Instrumentation Engineers
Other Authors: Staud, Wolfgang, Weed, J. Tracy
Format: Conference Proceeding Book
Language:English
Published: Bellingham, Washington : SPIE, [2004]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 5567.
Subjects:
Integrated circuits > Masks > Congresses.
Microlithography > Congresses.

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