Cover Image

24th Annual BACUS Symposium on Photomask Technology : 14-17 October 2004, Monterey, California, USA /

Show other versions (5)
Bibliographic Details
Corporate Authors: Symposium on Photomask Technology Monterey, Calif., BACUS (Technical group), Society of Photo-optical Instrumentation Engineers
Other Authors: Staud, Wolfgang, Weed, J. Tracy
Format: Conference Proceeding Book
Language:English
Published: Bellingham, Washington : SPIE, [2004]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 5567.
Subjects:
Integrated circuits > Masks > Congresses.
Microlithography > Congresses.
Description
Item Description:Some earlier conferences have title: Symposium on Photomask Technology and Management.
Physical Description:2 volumes (xix, 1450 pages) : illustrations (some color) ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:081945513X