Cover Image

Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA /

Bibliographic Details
Corporate Authors: Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH
Other Authors: Tobin, Kenneth W.
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2004]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 5378.
Subjects:
Manufacturing processes > Mathematical models > Congresses.
Manufacturing processes > Automatic control > Congresses.
Intelligent control systems > Mathematical models > Congresses.
Process control > Mathematical models > Congresses.
Description
Physical Description:xxx, 248 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819452912