Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA /

Bibliographic Details
Corporate Authors:	Society of Photo-optical Instrumentation Engineers, Semiconductor Equipment and Materials International, International SEMATECH
Other Authors:	Tobin, Kenneth W.
Format:	Book
Language:	English
Published:	Bellingham, Washington : SPIE, [2004]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 5378.
Subjects:	Manufacturing processes > Mathematical models > Congresses. Manufacturing processes > Automatic control > Congresses. Intelligent control systems > Mathematical models > Congresses. Process control > Mathematical models > Congresses.

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