Federal statutory protection for mask works.

Bibliographic Details
Corporate Author:	Library of Congress. Copyright Office
Format:	Government Document Book
Language:	English
Published:	[Washington, DC] (101 Independence Ave., SE, Washington 20559-6000) : U.S. Copyright Office, [2004]
Edition:	[Rev. 01/2004].
Series:	Circular (Library of Congress. Copyright Office) ; 100.
Subjects:	Copyright > United States. Design protection > United States. Masks (Electronics) Integrated circuits > Masks. Semiconductors.
Online Access:	https://purl.fdlp.gov/GPO/LPS43715

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