Cover Image

Photomask and next-generation lithography mask technology X : 16-18 April 2003, Yokohama, Japan /

Bibliographic Details
Corporate Authors: Photomask Japan, BACUS (Technical group), Ōyō Butsuri Gakkai, Semiconductor Equipment and Materials International (Japan), Society of Photo-optical Instrumentation Engineers
Other Authors: Tanabe, Hiroyoshi
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2003]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 5130.
Subjects:
Masks (Electronics) > Congresses.
Integrated circuits > Masks > Congresses.
X-ray lithography > Congresses.
Microlithography > Congresses.
Optoelectronic devices > Design and construction > Congresses.
Description
Item Description:Some earlier proceedings have title: Photomask and X-ray mask technology.
Physical Description:xxi, 1066 pages : illustrations (some color) ; 28 cm.
Bibliography:Includes bibliographical references and author index.
ISBN:0819449962