Photomask and next-generation lithography mask technology X : 16-18 April 2003, Yokohama, Japan /

Bibliographic Details
Corporate Authors:	Photomask Japan, BACUS (Technical group), Ōyō Butsuri Gakkai, Semiconductor Equipment and Materials International (Japan), Society of Photo-optical Instrumentation Engineers
Other Authors:	Tanabe, Hiroyoshi
Format:	Book
Language:	English
Published:	Bellingham, Washington : SPIE, [2003]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 5130.
Subjects:	Masks (Electronics) > Congresses. Integrated circuits > Masks > Congresses. X-ray lithography > Congresses. Microlithography > Congresses. Optoelectronic devices > Design and construction > Congresses.

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