Cover Image

Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA /

Bibliographic Details
Corporate Author: Society of Photo-optical Instrumentation Engineers
Other Authors: Starikov, Alexander, 1952-
Format: Book
Language:English
Published: Bellingham, Washington : SPIE, [2003]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 5042.
Subjects:
Integrated circuits > Design and construction > Congresses.
Integrated circuits > Defects > Analysis > Congresses.
Semiconductors > Design and construction > Congresses.
Semiconductor wafers > Defects > Analysis > Congresses.
Microelectronics industry > Quality control > Congresses.
Quality control > Congresses.
Description
Item Description:2002 conference proceedings titled: Design, process integration, and characterization for microelectronics.
Physical Description:viii, 418 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and index.
ISBN:0819448478