Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA /

Bibliographic Details
Corporate Author:	Society of Photo-optical Instrumentation Engineers
Other Authors:	Starikov, Alexander, 1952-
Format:	Book
Language:	English
Published:	Bellingham, Washington : SPIE, [2003]
Series:	Proceedings of SPIE--the International Society for Optical Engineering ; v. 5042.
Subjects:	Integrated circuits > Design and construction > Congresses. Integrated circuits > Defects > Analysis > Congresses. Semiconductors > Design and construction > Congresses. Semiconductor wafers > Defects > Analysis > Congresses. Microelectronics industry > Quality control > Congresses. Quality control > Congresses.

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